High Performance Clear Barrier Vacuum Coating

CVD Technology (Chemical Vapour Deposition)

CVD Technology is a process which has been developed by General Vacuum Equipment (GVE) with both purpose built, modular designed, full production and pilot machinery. The process utilises the fourth state of matter - plasma - an ionised gas to enhance the environmentally friendly CVD process for high rate deposition of clear SiOx (Silicon Oxide) coatings at low temperatures, under moderately low pressure. Readily available low cost process gases are utilised together with a silicon containing a precursor, commonly HMDSO (HexaMethylDiSilOxane). Substrates for flexible packaging can be coated with the ultra-thin SiOx based layers producing excellent barrier, adhesion and mechanical properties. The coated films are readily convertible into clear barrier packaging laminates. Such flexible packaging materials produced are:

Transparent High barrier Robust Recyclable FDA approved Environmentally friendly Microwaveable Able to detect metal in the package Retortable with excellent Gelbo flex resistance in laminated form

The low vacuum requirement together with rapid cleaning and low maintenance procedures provide an easy to operate, stable and rapid process cycle.

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